Leeds University Nanotechnology Cleanroom
The Leeds Nanotechnology cleanroom’s mission is to be a leading fabrication centre, supporting cutting edge research activities across the physical and life sciences. Our team of dedicated experimental officers and technical staff are available to work with users to discuss and develop new process.
leeds_cleanroom_30
- Partner / Location:University of Leeds
- Facility:University of Leeds
Or call us now on 0161 306 7585
Detailed Description
The facility includes 200 m2 of ISO 5 (class 100) cleanroom containing a range of state-of-the art equipment to suit most micro- and nano-fabrication requirements, including photo- and e-beam lithography, deposition, wet and dry etching, post-processing and characterisation. The facility’s flagship 100 kV, Jeol 6300FS electron beam lithography tool is capable of patterning sub-10nm features on up to 6” wafers and is housed in a dedicated ISO 3 (class 1), vibration isolated room. The cleanroom facilities are supported by a suite of peripheral ‘back end’ laboratories for post-processing activities including wafer sawing, scribing, wire bonding, and electrical characterisation.
Lithography:
- Joel JBX 6300FS Electron Beam Lithography System
- Heidelberg MLA150
- Karl Suss MJB 3 Mask Aligner
Physical vapour deposition
Chemical vapour deposition
- Plasma-Therm Vision 310 Plasma Enhanced Chemical Vapour Deposition (PECVD)
- Veeco Fiji 200 Atomic Layer Deposition (ALD)
Dry etching
- Plasma-Therm Apex SLR Inductively Coupled Reactive Ion Etcher (ICP-RIE)
- Scia Mill 150 Ion Beam Etching (IBE)
- JLS Designs Minilab 80 parallel plate RIE
Packaging and post-processing
Enquire now
Fill in the form and a member of the Royce team will be in touch.
Thanks for your message, it has been sent.
