Detailed Description

Uses/Applications

The facility includes 200 m² of ISO 5 (class 100) cleanroom containing a range of state-of-the art equipment to suit most micro- and nano-fabrication requirements, including photo- and e-beam lithography, deposition, wet and dry etching, post-processing and characterisation. The facility’s flagship 100 kV, Jeol 6300FS electron beam lithography tool is capable of patterning sub-10nm features on up to 6” wafers and is housed in a dedicated ISO 3 (class 1), vibration isolated room. The cleanroom facilities are supported by a suite of peripheral ‘back end’ laboratories for post-processing activities including wafer sawing, scribing, wire bonding, and electrical characterisation.