OVERVIEW

This course will introduce thin-film deposition and analytical techniques for characterising thin films. The content explores physical vapour deposition techniques, and will cover deposition parameters, structural characterisation and the electrical behaviour of a simple device.

Practical training will cover basic lab skills for working with the ultra-high-vacuum environments needed for high quality thin film growth. Through use of the Royce Deposition System participants will gain hands-on experience of, sputtering, molecular beam epitaxy (MBE) and pulsed laser deposition (PLD). Each participant will grow and characterise their own samples, including taking measurements of film thickness and surface morphology. The course will also include a short session on cleanroom fabrication to make a microscale wire from a thin film.

LOCATION

Sir William Henry Bragg Building, University of Leeds, Leeds, LS2 9JT

BACKGROUND & MOTIVATION

The growth of thin films often forms the basis for device fabrication and is an important part of many technologies, including computing and communications hardware. These technologies, the means of their manufacture, as well as sustainability and critical infrastructure requirements call for advanced technical skills in both research and industry.

Molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) are suited to research and development of new materials systems; while sputtering is a growth processes used widely across research and industry. Whilst the techniques covered are based on the Royce Deposition System, the concepts are relevant to many thin film deposition approaches.

AUDIENCE

The course is of relevance to researchers wanting to gain practical experience in the growth and characterisation of thin films. The content will be suitable to those approaching thin film deposition for the first time or those wanting to expand their existing knowledge and learn about new techniques.

Participants might include PhD students or postdoctoral researchers, established researchers in academia or industry, as well as technicians, experimental officers, and engineers who are new to the field or wanting to retrain to work in deposition facilities.

LEARNING OUTCOMES

After this event, participants should be able to:

• Explain the process of physical vapour deposition techniques
• Apply appropriate methods and parameters in deposition experiments
• Conduct simple procedures in high-vacuum environments for quality thin-film growth
• Select appropriate methods for thin-film characterisation

APPLICATION

The course is limited to 12 places. Selection is based on submission of a written motivation for why you want to attend the course. Places will be awarded to ensure participants come from across universities, research institutes and industry.

Please note: Registration for the course closes 23:59 Sunday 14 January.  If we receive a large volume of applications, we may close before this date. We encourage early applications.

If you have any questions about the course, please email:  royce@leeds.ac.uk

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