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Bruker Dimension Icon Pro AFM with 200 mm wafer stage
Wafer Scale Atomic Force Microscopy (AFM)
For measurement and semi-automated mapping of nanoscale topography and materials properties across samples of up to 200 mm diameter.
- Partner:University of Cambridge
- Facility:Department of Materials Science
- Availability:Available
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Detailed Description
The Bruker Dimension Icon Pro is a scanning probe microscopy system capable of accurately mapping materials topography and device electrical properties at the nanoscale across a full 200 mm wafer, without requiring any wafer rotation or manual position adjustment, thus allowing semi-automated morphology and performance sampling.
It has the capability to measure a wide range of electrical properties on both unprocessed materials and processed operating devices: resistance, conductance, capacitance, local potential, piezoelectric response, magnetism and photoconductivity. It also has substantial capabilities for the measurement of mechanical properties at the nanoscale.
Key functions include measuring the electrical conductivity of delicate samples (using PeakForce tunnelling atomic force microscopy) and the photoconductive properties of photovoltaic materials (using photoconductive atomic force microscopy).
Uses/Applications
Typical uses of the system include topographic measurements of semiconductor materials, particularly GaN, with imaging of monolayer steps and quantification of extended defect densities being routine. Electrical modules are used to identify unintentionally doped regions and the impact of detects on local electrical properties. TUNA and KPFM are used, comparing data with and without illumination, to reveal inhomogeneities in perovskite solar cells. Multiple projects address 2D materials, including their impact on composite structures, with TUNA and FFM being used to address electrical and mechanical properties respectively in this context.
The Bruker Dimension Icon Pro is a scanning probe microscopy system with a stage which holds samples up to a 200 mm (8-inch) wafer, with all points on the stage accessible without wafer rotation. Semi-automated mapping is available. For atomic force microscopy (AFM) topographic measurements, the noise floor is 0.3 Angstrom.
Topographic measurements may be performed in contact mode, tapping mode or PeakForce tapping mode, and in-built materials property measurement modes include Kelvin probe force microscopy (KPFM), magnetic force microscopy (MFM), piezo-response force microscopy (PFM), friction force microscopy (FFM), phase imaging and quantitative nanomechanical mapping (QNM).
The system is also equipped with modules for scanning capacitance microscopy (SCM), scanning spreading resistance microscopy (SSRM), and extended tunneling AFM (TUNA) which accesses the current ranges for both standard TUNA and conductive AFM (CAFM). It is equipped with a 1 sun light source which allows illumination of transparent samples from the back side during measurement, for photo-conductive AFM and measurements on light-sensitive samples.