Multi-source Sputter Physical Vapour Deposition

Bespoke 'in house' rig

Cranfield University | National High Temperature Surface Engineering Centre

PVD coating, also known as thin-film coating, uses a vacuum chamber to vaporise a solid material and deposit it onto a target substrate, atom by atom.

Description

4 x Planar magnetron sputter coater (target size 345x145mm), sputtering horizontally. The substrates are mounted on an 8-station carousel and can be mounted on a flat holder (approx. 150 x 150mm) or rotated in front of the flux. The system is fully automated allowing complex deposition recipes with pulsed-DC power supplies. Substrate bias and glow discharge cleaning are installed.

Uses / Applications

Deposition of multi-layered wear resistant coatings. Deposition of metallic layers by sputter deposition.