FEI HELIOS 660i Nanolab FIB with Oxford EBSD & EDS system

Focused Ion Beam (FIB)

Extreme high-resolution (XHR) Field Emission Scanning Electron Microscope (FE SEM)

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Detailed Description

The FEI HELIOS 660i Nanolab FIB with Oxford EBSD & EDSsystem is a high-resolution Focused Ion Beam (FIB) system equipped with extreme high-resolution (XHR) Field Emission Scanning Electron Microscope (FE SEM). It also has a large area high-efficiency EDS detector for local elemental chemistry. High-speed, high-precision EBSD detector for sample crystallographic analysis in one system.

Uses/Applications

This is a unique and versatile characterisation tool. It allows for the precise characterisation of nanometer details and analysis in 2D and 3D, very high quality sample preparation and flexible nanoprototyping.

Ion beam

Field emission focused ion beam optics with liquid Gallium ion emitter.

Voltage: 0.5 kV to 30 kV

Beam current: 0.1pA – 65nA

Resolution: 4.0 nm at 30 kV

Electron optics

Dual-mode magnetic immersion / field free lens electron optics with ultra-high brightness

Source: Schottky field emitter

Landing energies: 20 V to 30 kV

Beam current: 0.8 pA – 100 nA

Resolution: 0.6 nm at 15 kV

Scanning

Up to 6144×4096 pixels

Patterning

Resolution: 64k x 64k

Pattern size: 8M pixels

Variable dwell time pattern to give 3D milling

Complex milling patterns through Bitmap import

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