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Wallwork IP85 Dual EB Dual Magnetron Coating machine
Electron beam plasma vapour deposition
A twin Electron Beam dual-evaporant source PVD system
- Partner:The University of Manchester
- Facility:Coatings Cluster
- Availability:Available
Or call us now on 0161 275 8382
Detailed Description
Uses/Applications
The novel process monitoring and control system, together with the novel plasma enhancement device opens up new coating systems for EB deposition (including oxide ceramics deposited at high rate) as well as novel plasma thermochemical diffusion systems and processes to facilitate advanced duplex (treatment and coating) systems. The EB system will be particularly suitable for applications requiring thicker coatings (such as Al-based amorphous PVD coatings to replace electroplated hard chrome and cadmium), with applications in the automotive, aerospace and energy sectors.
A twin Electron Beam dual-evaporant source PVD system, incorporating enhanced plasma assistance using a non-contaminating plasma intensification device based on a hollow cathode discharge. The system will incorporate a novel “confined plasma” diagnostic device which has recently been developed for EB-PVD and which can provide deposition species-specific information in real time.