JEOL JBX-5500FS Electron Beam Lithography (EBL)

Electron beam lithography

Electron beam lithography system.

  • Partner:University of Oxford
  • Facility:DWB Cleanroom
  • Availability:Available
Enquire Now

Or call us now on 0161 275 8382

Detailed Description

The system has an interferometer-controlled stage which allows for the possibility of writing nanoscale patterns across large substrates with a stitching accuracy between writing fields better than 15 nm. The electron beam is generated by a ZrO/W emitter and is focussed via a four-stage electron lens system.

Beam current: 100 pA – 40 nA
Acceleration voltage: 25 kV – 50 kV