Raith EBPG 5200 thermal lithography tool

Electron Beam Lithography System

Electron Beam Lithography System with a thermal field emission gun

Enquire Now

Or call us now on 0161 275 8382

Detailed Description

The Electron Beam Lithography System is a RAITH – EBPG 5200 with a thermal field emission gun for operation at 100 kV, a high KV for high aspect ratio nanostructures, including high speed direct write with full automatization.


  • Flexible configuration to fit application requirements
  • Fabrication of deep nanoscale devices, Developing novel nanoelectronic devices
  • On-chip integrated optoelectronic circuits
  • Quantum devices
  • Layered material related devices
  • Photonic systems
  • Plasmonic systems
  • Cutting edge fabrication of small scale (lab level) and expanding these capabilities towards a large scale production

It has the fastest Gaussian Beam system on the market, with fast, arbitrary shape pattern generator of 100MHz. It can process 200 mm (8 inch) wafers and 7 inch masks with a minimum feature size less than 8 nm. The precise overlay of features size is less than 10nm and is the fastest tool for “high density” patterns.