Bespoke 'in house' Chemical Vapour Deposition rig

Chemical Vapour Deposition

Thermal Chemical Vapour Deposition plant

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Detailed Description

Used for thermal halide Chemical Vapour Deposition of gas-turbine blades and alloy substrates. Materials deposited include Al, Cr, Hf, Si, Y at temperatures of up to 1100°C. Shield gas is argon or argon-hydrogen and the process is carried out at atmospheric pressure.


Coating of Turbine blades and similar high temperature components. In combination with sputtering facilities, the ability to manufacture precious metal aluminide intermetallic coatings.