In partnership by the Universities of Cambridge, Leeds and Swansea University
Overview
This training course will explore basic practices and techniques for cleanroom use. Through a combination of taught lectures, discussion sessions, and practical training participants will gain fundamental skills for working in cleanrooms. The course will develop theoretical and practical knowledge in a wide range of cleanroom techniques including lithography, deposition, and etching; with participants using what they learn to fabricate a micro-scale Field Effect Transistor.
This unique opportunity is suited to both industrial and academic participants and will enable scientists and engineers from a range of disciplines to gain first-hand experience of clean-fabs and semiconductor device processing. The course will also be applicable to scientists and engineers using nanofabrication to develop, for example, spintronic or bioelectronic devices.
The course is a collaboration between the Universities of Cambridge, Leeds and Swansea and CS Connected and is supported by the Atoms to Devices theme at the Henry Royce Institute.
Background
Micro and nano-fabrication techniques in ultra-clean environments are the cornerstone of semiconductor manufacturing and technology innovation. Processes such as lithography, thin-film deposition and etching of semiconductors, metals and dielectrics are used to build components such as field effect transistors, diodes, waveguides, thus creating memory, logic, solar cells, lasers, detectors, sensors, photonic chips and many more high-tech devices.
These ultra-clean advanced processing environments are called ‘clean-fabs’ and the skills required to operate within them are very specific and much in demand in both industrial manufacturing and research and development. Several UK universities including the University of Cambridge, the University of Leeds and Swansea University have recently built state-of-the-art clean-fabs. These investments of hundreds of millions of pounds aim to develop the next generation of semiconductor technology, support the existing UK semiconductor industry, and provide a means to train the necessary national workforce.
Audience
The course is a unique opportunity for industrial or academic scientists and engineers, that will enable participants from a range of disciplines to gain first-hand experience of clean-fabs and semiconductor device processing. It is also applicable to scientists and engineers using nanofabrication to develop spintronic or bioelectronic devices.
The content is suitable for any new user of cleanrooms and those who are looking to pursue a career in semiconductors and related fields. Participants might include those undertaking a PhD or postdoctoral research, working in academia or within the semiconductor industry.
As part of the EPSRC NTPMI project, we will be organising a similar course for research technical professionals later in 2025. Please contact NTPMI@royce.ac.uk if you are interested in attending this future event.
Application
The course is limited to 20 places. The closing date for applications is 15th November 2024.
Selection will be based on participant’s written motivation for attending the course. We aim to balance the course participants to reflect a range of career stages, scientific backgrounds, and organisations including universities, research institutes and from industry.
If you have any questions about the course, please email royce@leeds.ac.uk.
