Description
The system’s ability to simultaneously deposit from a large number of sources, along with its capability to create variable compositions on a single wafer, makes it ideal for materials discovery in such areas as high entropy metal alloys (alloys with five or more elements in similar proportions). The system will also allow the exploration of new functional materials systems, for example, thin-film magnetic multi-layers and functional ceramics.
Uses / Applications
Thin film sputtering and e-beam evaporation for thin film alloy development.
Specification
Number of Targets: 6
Deposition Speed: 1s-10s Å/s
