Description
The core ability to create almost arbitrary complex 3D structures is enabled by a nonlinear optical phenomenon called two-photon polymerization. This allows to directly write 3D micro- and nanostructures into a broad range of photoresists with different chemical and/or physical properties, e.g. SU-8, Ormocere, AZ- or Nanoscribe‘s proprietary IP-photoresists.
The ultra-precise piezo actuated stage implemented in the Photonic Professional system allows for a writing of arbitrary shaped 3D trajectories. In addition, a high-speed galvo writing mode is available for a later upgrade of the system.
Uses / Applications
High resolution printing of UV-curable resins; ideal for biomimetic structures and complex models, e.g. vascular models
Specification
Laser: NIR Femtosecond Class I laser
Minimum 3D Feature size: 200 nm (spec.); 160 nm (typ.)
Finest 2D Material resolution: 500 nm (spec.); 400 nm (typ.)
Finest Z-axis resolution: 1,500 nm (spec.); 1,000 nm (typ.)
Beam scanning speed: 10 mm/s
Piezo speed: 100 um/s
Printable area: 100 x 100 mm2
Maximum object height: 300um (fine); 3mm (coarse)
