Sentech Etchlab 200

Reactive Ion Etching

Reactive Ion Etching (RIE) is a process whereby chemical etching is accomplished through the bombardment of ions.

  • Partner / Location:Imperial College London
  • Contact:Peter Petrov
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Detailed Description

This technique can be used for etching various materials for top-down fabrication of multi-layer thin films or functional devices such as metals, semiconductors, dielectric materials or combinations. It also has the advantage of using multiple gases such as CF4, Argon, Oxygen, and Nitrogen.


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