Neocera Pulsed Laser Deposition System
Pulsed Laser Deposition (PLD) System
Pulsed Laser Deposition (PLD) is a physical vapour deposition technique used to produce thin films of complex materials over a wide range of background gas compositions or pressures.
- Partner:Imperial College London
- Facility:Thin Film Technology Laboratory
- Availability:Available from Spring 2022
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Our PLD system consists of four fully-automated deposition chambers, each equipped with a six-position target carrousel that allows deposition of multilayer structures formed of up to six different materials. There is a deposition chambers with diode substrate heater that allows deposition at temperatures up to 1200°C. Layer-by-layer growth of functional materials, controlled by a kSA 400 RHEED system is also available in our specialised UHV deposition chamber.
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