Platform for Nanoscale Advanced Materials Engineering (P-NAME)

Photon Science Institute (PSI) | University of Manchester

Enables electronic, optical and magnetic doping of advanced materials to provide localised control of functionality with sub-20nm precision.

Description

The Platform for Nanoscale Advanced Materials Engineering (or PNAME) has 2 beams:

1) a multi-ion liquid metal alloy ion source FIB for sample doping and patterning;

2) an electron beam for sample imaging and exposure (SEM).

Key capabilities:
– sub-5nm resolution e-beam imaging enabling the target for doping to be identified without ion contamination;
– isotopically-selected ion doping of species from liquid metal ion sources with sub- 20nm resolution;
– deterministic single ion to high dose (e.g. 1019 ions/cm2) doping at energies from ~5 to 75 keV (species dependent);
– 150mm (6-inch) sample handling with vacuum suitcase compatibility.
– in-situ electrical measurements possible

Isotopic species available Au, Ge, Sb, Nd, Cu, Co, B, Mn, Pt, P, In, Ni, Si, Pb, Sn, Bi, Er.