Oxides E-Beam Epitaxy Deposition System

The Mantis Oxides E-Beam Epitaxy Deposition System is an electron beam physical vapour deposition system used for the deposition of oxide thin films. It employs three high-power e-beam molecular sources and an oxygen RF plasma source.

  • Partner / Location:Imperial College London
  • Contact:Peter Petrov
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Detailed Description

It has a typical base pressure of 10-9 torr and operates within the temperature range from room temperature to 1000°C. It is equipped with RGA and RHEED systems for precise thin film growth control. It has a heated load-lock with 20x, 4” wafer storage facility.

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