Description
This equipment is part of Surface Characterisation of the Multidisciplinary Characterisation Facility.
XPS is a surface sensitive technical limited by the electron escape depth (~5- 10 nm). Our high throughput XPS instrument includes gas cluster ion etching, ultraviolet photoelectron spectroscopy (UPS), and electrical biasing and heating and cooling is available, along with inert transfer.
The system is connected to a flexible preparation chamber and includes UPS (ultraviolet photoelectron spectroscopy) and argon cluster etching (Ionoptika GCIB 10S). UPS is used for work function and valence band measurements, and argon cluster etching enables destructive depth profiles into the surface. The system accommodates samples up ~ 40 x 100 x 40 mm (width x length x height).
Uses / Applications
Applications are across a broad range of advanced materials research, as probe of the elemental and chemical environment at the surface.
