The near ambient pressure (NAP) X-ray photoemission spectroscopy (XPS) system is for high-throughput chemical surface analysis under application relevant environmental conditions. The system overcomes barriers of traditional XPS systems by enabling analyses at a wide range of atmospheres ranging from 10-7mbar up to 100 mbar. Via three separate, mass-flow controlled gas inlets, the system can create a wide range of reactive environments and hence to directly probe energy materials and devices under application relevant conditions. Via a sample holder with built-in laser heating, the tool allows direct probing of samples at temperatures up to 1000°C in these atmospheres, enabling for instance new insights into material growth and discovery in particular for nanomaterials relevant to EE ICT.
There is a built-in plasma cleaning and specific holder design to minimise cross-contamination and a horizontal sample loading. Sample loading is also possible without going through high vacuum, so a wide range of materials can be probed including liquids, biological materials, ceramics, polymers and materials with high vapour pressures.
The system uses a SPECS XR 50 MF X-ray Source, μ-FOCUS 600 X-ray monochromator and differentially pumped PHOIBOS 150 1D-DLD NAP analyser. The system also has scannable focused extractor type ion source for depth profiling. The system will be run as an XPS facility together with existing standard UHV-based XPS/UPS system.
- Create a wide range of reactive environments and to directly probe energy materials and devices under application relevant conditions
- Via a sample holder with built-in laser heating, direct probing of samples at temperatures up to 1000C
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