CVD/PVD suite

Royce Hub building | University of Manchester

Chemical vapour deposition and Physical vapour deposition

Description

A range of custom built systems are available which enable the coating of metals or oxides, including chemical vapour infiltration and e-beam physical vapour deposition. This process enables a unique degree of control over structural features such as size and surface texture of support particles and size and number density of supported metal particles or the thickness of oxide shells.

Uses / Applications

Our research focus is to examine degradation of ceramic coatings/layers in harsh environments, applications include: thermal barrier coatings for aeroengines and power generation; ceramic coatings for nuclear industry applications; ceramic layers for battery applications.

Specification

Equipment in use includes:

  • A chemical vapour infiltration (CVI) system.

  • A twin electron beam dual evaporant source plasma vapour deposition system (EB-PVD), incorporating enhanced plasma assistance using a non-contaminating plasma intensification device based on a hollow cathode discharge.

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