Chemical Vapour Deposition

Bespoke 'in house' Chemical Vapour Deposition rig

Thermal Chemical Vapour Deposition plant

Description

Used for thermal halide Chemical Vapour Deposition of gas-turbine blades and alloy substrates. Materials deposited include Al, Cr, Hf, Si, Y at temperatures of up to 1100°C. Shield gas is argon or argon-hydrogen and the process is carried out at atmospheric pressure.

Uses / Applications

Coating of Turbine blades and similar high temperature components. In combination with sputtering facilities, the ability to manufacture precious metal aluminide intermetallic coatings.

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