Description
The Zeiss UltraXRM810 is one of the highest resolution lab-based X-ray tomography system available. The system permits imaging at nanometer scale by using state-of-the-art zone plate X-ray optics to achieve resolutions as fine as 50 nm. Two resolution modes, large field of view (65 x 65 μm) and high-resolution (16 x 16 μm), are available for multi-scale imaging. Zernike phase contrast can be used to compliment absorption contrast to highlight sample boundaries when absorption is low.
Uses / Applications
Small samples of up to approx 100 μm diameter, depending on material.
Specification
Chromium anode with kα at 5.4keV.
Two resolution modes, large FOV (65 x 65 μm) and high-res FOV (16 x 16 μm), with voxel sizes down to 65 x 65 nm and 16 x 16nm, respectively.
In-situ deformation capable by using the Zeiss Ultra Load Cell tension/compression rig (0.8N maximum load)
