Description
The advanced lithography infrastructure of eLINE Plus supports both ultra-high-resolution electron beam lithography and large-area nanofabrication. Moreover, eLINE Plus’ multifunctionality unites the worlds of electron beam lithography, nanoengineering, ultra-high resolution, and large-area SEM imaging, including dedicated features for metrology and process control.
eLINE Plus provides the following smart building blocks and concepts:
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Advanced 30 kV TFE electron optical column technology
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Innovative and unique stitch-error-free writing strategies
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Dedicated features for automated waferscale metrology and process control
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Laser Interferometer Stage
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Multiple detector concept
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Multiport vacuum chamber
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Open and upgradable platform concept
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Raith NanoSuite: comprehensive software interface with all modules fully integrated
The eLINE Plus is designed for ultimate flexibility and versatility in the field of multi-technique in-situ nanofabrication beyond classical electron beam lithography. Fully equipped with all nanoengineering options, the tool philosophy is aligned with the workflow “fabricate, relocate, modify, measure”.
Uses / Applications
https://www.raith.com/company/micrograph-award/winner-applications/
Specification
‘-5-30 kV beam energies,100um write field size, >2nm stiching error, 7.5-120um beam appatures, common to achive 20nm feature size with 10nm gaps, 3D SEM stage for angled sample inspection, >5nm SEM resolution.
