Description
Electronic beam evaporation, also known as e-beam evaporation, is one of the four main forms of physical vapour deposition (PVD). It uses an intense beam of high-energy electrons to evaporate the source material, reducing limitations on maximum evaporation temperatures.
E-beam evaporation works in a different way to sputtering, which collides energetic ions with a target to sputter or eject the target material. Electron beam evaporation expands upon the applications of thin film deposition common to more traditional vaporisation processes.
The Mantis Oxides E-Beam Epitaxy Deposition System is an electron beam physical vapour deposition system used for the deposition of oxide thin films. It employs three high-power e-beam molecular sources and an oxygen RF plasma source. It has a typical base pressure of 10-9 torr and operates within the temperature range from room temperature to 1000°C. It is equipped with RGA and RHEED systems for precise thin film growth control. It has a heated load-lock with 20x, 4” wafer storage facility.
