Description
The Electron Beam Lithography System is a RAITH – EBPG 5200 with a thermal field emission gun for operation at 100 kV, a high KV for high aspect ratio nanostructures, including high speed direct write with full automatization.
Uses / Applications
- Flexible configuration to fit application requirements
- Fabrication of deep nanoscale devices, Developing novel nanoelectronic devices
- On-chip integrated optoelectronic circuits
- Quantum devices
- Layered material related devices
- Photonic systems
- Plasmonic systems
- Cutting edge fabrication of small scale (lab level) and expanding these capabilities towards a large scale production
Specification
It has the fastest Gaussian Beam system on the market, with fast, arbitrary shape pattern generator of 100MHz. It can process 200 mm (8 inch) wafers and 7 inch masks with a minimum feature size less than 8 nm. The precise overlay of features size is less than 10nm and is the fastest tool for “high density” patterns.
