Description
Non-destructive measurement based on the change of the polarisation state of light after reflection at non-normal angle of incidence from the surface of interest. Ellipsometry is highly sensitive even for layer thickness below 5 nm and gives numerous parameters for characterising multilayer structures (eg. layer thickness, refractive index, absorption, porosity). Wavelength range extended into near-IR.
Uses / Applications
Thickness measurements can be used to ensure uniformity of film samples as well as efficacy of film deposition/production methods in packaging applications etc. Optical measurements can assess the suitability of polymeric thin films in applications such as printing, photography, packaging, UV barrier properties of laminates.
Specification
Large spectral range from 190nm up to 25μm.
Spectroscopic ellipsometry for film thickness and optical functions (RI).
Generalised ellipsometry for anisotropic materials.
Transmission ellipsometry for transparent substrates.
Measurements both in reflectance and transmission.
Porosimetry for measuring pore size of samples.
