High-throughput X-ray Photoelectron Spectroscopy (HT-XPS)

ESCA-2SR

X-ray photoelectron spectroscopy (XPS) enables elemental compositions and the chemical state of the atoms in a material to be quantified. It is a surface sensitive technical limited by the electron escape depth (~5- 10 nm). Our high throughput XPS instrument includes gas cluster ion etching, ultraviolet photoelectron spectroscopy (UPS), and electrical biasing and heating and cooling is available, along with inert transfer.

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Description

The system is connected to a flexible preparation chamber and includes UPS (ultraviolet photoelectron spectroscopy) and argon cluster etching (Ionoptika GCIB 10S). UPS is used for work function and valence band measurements, and argon cluster etching enables destructive depth profiles into the surface. The system accommodates samples up ~ 40 x 100 x 40 mm (width x length x height).

Research Output:

https://doi.org/10.1021/acs.jpcc.0c10095

https://doi.org/10.1039/C8CC08932A

https://doi.org/10.1016/j.apsusc.2019.144764

Contact

xps@manchester.ac.uk