The Escalab 250Xi provides X-ray photoemission spectroscopy (XPS) for chemical analysis of surfaces under inert, UHV conditions. It can provide Ultra-violet Photoemission Spectroscopy (UPS) for measurements of valence bands and work functions with a 21.2eV excitation source, and non-destructive Angle Resolved X-ray Photoemission Spectroscopy (ARXPS) by varying the angle that the sample is held at and in this way varying the analysis depth down to a few nanometers. The equipment is able to depth profile materials using x-ray photoemission spectroscopy (DPXPS) which combines a sequence of argon ion gun etch cycles with XPS analysis. This is a destructive technique. This system is run alongside the complimentary Cambridge-Royce near ambient pressure (NAP) X-ray photoemission spectroscopy (XPS) system as a combined joint facility.
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