The Precision Ion Polisher System uses focused gas ion beams to remove material from a sample of interest.
- Partner:UK Atomic Energy Authority
- Facility:Materials Research Facility (MRF)
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Detailed Description
This system produces fine quality conductive and non-conductive 3mm diameter TEM specimens by using low energy ion beam(s) for slowly milling away materials from a sample.
Uses/Applications
This system can also use its low energy gas ion beam to remove FIB-induced damage on any FIB TEM lift-outs.
Gatan Precision Ion Polishing System (PIPS II)
Ion Source
2 miniature Penning ion guns (Ar) with low energy focusing electrodes
Accelerating voltage: 100 V – 8 kV
Milling angle: -10ᵒ to + 10ᵒ
Ion current density peak: 10mA/cm2
Specimen Stage
Sample size: 3 mm diameter disc
Rotation: 1 – 6 rpm
X, Y transition: ± 0.5 mm
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