The equipment is not available until May 2021 due to being relocated.
The University of Leeds had four Mask Aligners designed for for UV lithography, a microfabrication process to selectively remove parts of a thin film of photoresist on a substrate. It uses UV light to transfer a geometric pattern from a photomask to a light-sensitive photoresist on the substrate. Sub-micron size features can be created after a series of chemical developments and thermal treatment.

- Partner:University of Leeds
- Facility:Leeds University Nanotechnology Cleanroom
Or call us now on 0161 275 8382
Detailed Description
Models available:
- Karl Suss MJB 3
- Karl Suss, MJB 4
- Karl Suss, MJB 5
- EV Group EV610
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