Multiple Models

Mask Aligner

The equipment is not available until May 2021 due to being relocated.

The University of Leeds had four Mask Aligners designed for for UV lithography, a microfabrication process to selectively remove parts of a thin film of photoresist on a substrate. It uses UV light to transfer a geometric pattern from a photomask to a light-sensitive photoresist on the substrate. Sub-micron size features can be created after a series of chemical developments and thermal treatment.



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Detailed Description

Models available:

  • Karl Suss MJB 3
  • Karl Suss, MJB 4
  • Karl Suss, MJB 5
  • EV Group EV610



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