Mask Aligner

The equipment is not available until May 2021 due to being relocated.

The University of Leeds had four Mask Aligners designed for for UV lithography, a microfabrication process to selectively remove parts of a thin film of photoresist on a substrate. It uses UV light to transfer a geometric pattern from a photomask to a light-sensitive photoresist on the substrate. Sub-micron size features can be created after a series of chemical developments and thermal treatment.