Electron Beam Lithography System

The equipment is not available until May 2021 due to being relocated.

Vector scan electron beam lithography system

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Detailed Description

The JBX-6300FS is a state-of-the-art vector scan electron beam lithography system capable of patterning lines less than 10 nm wide. The system uses advanced electron optics to produce a minimum spot size of 2 nm from the ZrO/W (Schottky) electron source which also provides extremely stable currents over the range 30 pA to 20 nA. The electron gun can be configured to work at accelerating voltages of 25 kV, 50 kV or 100 kV. The main beam deflection employs a 19bit DAC while the sub deflector uses a 12bit DAC operating at 25MHz. The system has a maximum writing area of 150 x 150 mm and can handle substrate sizes of up to 200mm diameter (only tooling up to 75 mm wafers is currently available). An auto-loader provides for continuous unattended operation of up to 10 cassettes allowing high sample throughput. The overlay misalignment between electron-beam written patterns is below 25 nm.

Electron gun ZrO/W Shottky type
Writing method Spot beam, Vector scan, Step & repeat
Acc. Voltage 25kV (option), 50kV, 100kV
Material size Up to 200mmΦ wafer, Up to 5-inch or 6-inch mask, Micro sample of any size
Maximum field size 2000μmX2000μm
Stage movement range 190mmX170mm
Overlay accuracy ≦±9nm
Field stitching accuracy ≦±9nm
Scan speed Up to 50MHz

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