MBE-like PLD system with three deposition chambers and integrated RHEED system
Combined, magnetron sputtering – e-beam evaporation system
Fully equipped photolithography (“yellow”) room
RIE and Ion milling systems
MW cryo- probe stations and measurement equipment for on-wafer measurements under external electrical bias and magnetic field (up to 0.15T), in wide temperature (10K – 600K) and frequency (d.c. – 40 GHz) ranges.
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