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PVD thin film deposition

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PVD thin film deposition
Energy Storage

The MB-ProVap-5 is a versatile research and development tool for thin film deposition under vacuum conditions.
The medium size chamber offers additional space for more sources and optional deposition tools such as substrate heating and masking. The rectangular chamber design also offers additional pump configurations such as more powerful turbo-molecular and cryo-pumps.

Vacuum Chamber Specifications

Rectangular Chamber Design 500 mm x 500 mm x 500 mm (width x depth x height) (inner volume 125 l)
Full stainless steel with rear hinged service door and front sliding door
Removable protective shielding
Base flange with 24 high vacuum ports for source mounting
Top flange with high vacuum feedthroughs for substrate shutter and substrate rotation
DN160 interface for vacuum pump stack
Shielded DN100 viewport in front door
Ultimate vacuum down to: < 9 x 10-7 mbar

Evaporation Technology

Thermal resistance evaporation
Temperature controlled organic evaporation
RF, DC or DC Pulsed Magnetron sputtering
RF Magnetron sputtering with reactive gases and upstream or downstream control (mass flow controller)
Electron beam evaporation with multiple pocket arrangements

Substrate and pretreatment

For substrates up to 100×100 mm or 150 mm wafers
Heated/cooled substrate holder from -30°C up to 100°C
Rotatation up to 33 RPM
Integrated quartz lamp heaters
Optional in-situ systems available on request

System control

Siemens PLC with multi-color touch screen
Inficon controller for rate control/monitoring
Recipe management


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