Gatan Precision Ion Polishing System (PIPS II)

Precision Ion Milling System

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Precision Ion Milling System
Nuclear Materials

The Precision Ion Milling System uses focused gas ion beams to remove material from a sample of interest. This system produces fine quality conductive and non-conductive 3mm diameter TEM specimens by using low energy ion beam(s) for slowly milling away materials from a sample.

Gatan Precision Ion Polishing System (PIPS II)

Ion Souce

2 miniature Penning ion guns (Ar) with low energy focusing electrodes

Accelerating voltage: 100 V – 8 kV

Milling angle: -10ᵒ to + 10ᵒ

Ion current density peak: 10mA/cm2

Specimen Stage

Sample size: 3 mm diameter disc

Rotation: 1 – 6 rpm

X, Y transition: ± 0.5 mm


This system can also use its low energy gas ion beam to remove FIB-induced damage on any FIB TEM lift-outs.

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